多晶硅经光刻后便形成力敏电阻条。
Photoetching polysilicon forms force sensitive resistance bar.
介绍镍浆料和厚膜湿敏电阻器的制备工艺。
The preparation technology of nickel paste and thick-film humidity sensitive resistor is introduced.
对磁敏电阻的阻值随其在磁场中的角度位置变化而改变这一特性进行了实验研究。
The research is based on properties of magnetoresistor, whose resistance varies with the angle position in the magnetic field.
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