polishing etch
... photoelectric eletret 光致介电驻极体 polishing etch 抛光腐蚀液 perfect diffuser 全扩散体，全漫射体 ...
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分析了W - CMP的机理，抛光液对W材料表面具有化学腐蚀和机械研磨的双重作用，对抛光速率有着重要的影响。
The mechanism of W-CMP was analyzed, the slurry makes a dual function of chemical erosion and mechanical lapping, has an important influence on the polishing rate.
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