介绍了在化学机械抛光过程中，可以通过抛光头与抛光台运动速度关系优化配置，降低晶片表面不均匀度，从而更好地实现晶片局部和全局平坦化。
This paper introduces that we can reduce Within wafer nonuniformity (WIWNU) to achieve part and full planarization by distributing the speed of polishing head and polis.
“生活没有意义，”阿伟说。他在一整夜的轮班里抛光了数百台手机，连指甲都被磨出的灰尘染黑了。
"Life is meaningless," said Ah Wei, his fingernails stained black with the dust from the hundreds of mobile phones he has burnished over the course of a 12-hour overnight shift.
混凝土地面抛光转，形成了整体厨房中央台可容纳一个炉灶，与客户相称的食物的爱。
Polished concrete floors turn up to form the monolithic kitchen island bench which accommodates a cooking range, commensurate with the clients love for food.
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