n. resist
misc. slushing compound
光致抗蚀剂 photoresist ; Liquid Photoresist ; photo-resistphotoresist
干膜抗蚀剂 [机] dry film resist ; dry film photoresist
电子束抗蚀剂 electron resist ; electron sensitive resist ; electron beam resist
近紫外线抗蚀剂 near uv resist
光致抗蚀剂掩模 [电子] photoresist mask ; photolacquermask
掺杂剂抗蚀剂 dopant resist
抗蚀剂掩模 Etching mask
双重光致抗蚀剂 double photoresist
A simulation is performed for the purpose of obtaining the optimum resist thickness to reduce (CD) difference caused by the variations of resist thickness in the real topography.
为减小实际图形因抗蚀剂厚度变化引起的CD差异，获得最佳抗蚀剂厚度，进行了一种模拟研究。
参考来源 - 光学光刻工艺中邻近效应的定量分析 Quantitative Analysis of the Proximity Effect in Optical Lithographic Process·2,447,543篇论文数据，部分数据来源于NoteExpress
可聚合组合物，聚合物，抗蚀剂及蚀刻方法。
Polymerizable composition, polymer, resist, and lithography methods.
采用新型的多层抗蚀剂结构的电子束光刻来形成图形。
Electron - beam lithography with a novel multilevel resist structure defines the pattern.
画电子散射轨迹图、抗蚀剂能量吸收图、抗蚀剂显影图。
How to plot the figure of electron track, the figure of the energy absorbed by resist, the profile of the developed resist.
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