掩模制作是电子束散射角限制投影光刻(SCALPEL)的关键技术。
Mask fabrication is a key technique of scattering with angular limitation projection electron-beam lithography (SCALPEL).
利用此结论创建用于压缩的二值掩模矩阵，并对光栅投影图之一的位相图进行基于离散余弦变换的压缩。
Using this conclusion and considering the characteristic of grating projective images, the paper creates the 0-1 value mask to compress the DCT coefficient matrix.
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