采用rie法，利用PIN光电二极管，研究了干法腐蚀损伤机理及引起损伤的主要因素。

Mechanism of dry etching damage and main causes for RIE induced - damage are investigated with RIE technique by utilizing PIN photodiodes.

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寻求以改善干法蚀刻的工艺为主要手段，通过改进整个铝金属工艺流程为辅助手段，能够有效的改善铝金属腐蚀的缺陷的解决方案。

Improvement of Dry ETCH process as the main means, and the improvement of the whole Aluminum ETCH flow as accessorial means. We want to get effective solution of Aluminum corrosion defect.

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但不管是湿法还是干法纺丝，都要使用大量有毒有害或有腐蚀性的溶剂。

But both in the process of wet or dry spinning, large amount of deleterious solvents, which are unfriendly to the environment, have been used.

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