该文研究了局部对称共形平坦空间中具有常数量曲率的紧致子流形，证明了这类子流形的某些内蕴刚性定理。
In this paper, the authors discuss the submanifolds with constant scalar curvature in a locally symmetric and conformally flat space, and obtain some intrinsic rigidity theorems.
目前，化学机械抛光技术(CMP)被认为是能够实现晶圆表面局部平坦化和全局平坦化的最佳方法。
At the present time, chemical mechanical planarization (CMP) is the most effective technology for global and local planarization of the wafer in IC manufacturing.
基于局部归一化的局部方差去噪模型在平坦区域去噪明显，但去噪速度慢，而且纹理细节保护欠佳。
Removal model based on local variance normalized can remove noise significantly in flat area but slowly and maintains the texture details poorly.
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