由于电子束在原子尺度不会绕射，所以它不会使得图案细节的边缘模糊。
An electron beam does not diffract at atomic scales, so it does not cause blurring of the edges of features.
所述设备具有用于保持衬底的衬底台，所述投影系统用于把已形成图案的射束投影到衬底的目标部分上。
The apparatus has a substrate table configure to hold a substrate, a projection system configured to project the patterned beam onto a target portion of the substrate.
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