讨论了采用浸液式光刻获得的成像结果和套刻结果。
In this paper we discuss the results on imaging and overlay obtained with immersion.
激光直写系统的应用，可以分成一次曝光制作光刻掩模和多次套刻曝光制作器件两个方面。
Mask making with one step exposure and device making with multiple overlay exposure are applications of the system.
为了保证在第一版掩膜版和第二版在套刻曝光的时候，能够精准的吻合进行套刻，并降低误差对结果的影响。
In order to ensure the mask in the first edition and second edition in exposure time, to coincide precisely and reduce errors.
应用推荐