使用X射线衍射和透射电镜分析，表明异质结是c轴取向外延生长。
X-ray diffraction and transmission electron microscopy establish that LCCO grew epitaxially inc-axis orientation on LCMO.
本文提出了用N/P硅外延片的结光电压光谱响应确定N/P硅外延片中少子扩散长度的方法。
Using the photovoltaic spectral response of epitaxial P-N junction, the paper suggests a method of determining the minority carrier diffusion length in N layer of N/P epitaxial silicon wafer.
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