在一个示范性实施例中，提供一种等离子处理室。
In an exemplary embodiment, a plasma processing chamber is provided.
该等离子处理室包括一个配置为容纳 基片的基片支撑件。
The plasma processing chamber includes a substrate support configured to receive a substrate.
一种等离子生成装置，其配置为将等离子向下提供至等离子处理室。
A plasma generation arrangement configured to provide plasma downstream to a plasma processing chamber.
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