文中从设备角度出发，对预处理均匀性、辊涂均匀性、固化制度等影响因素进行了探讨。
From the equipment point of view a discussion is made on the factors that affect the evenness of pretreated layer and coating layer and solidification system.
大体而言，本发明的实施例提供了改进的等离子处理机构、设备和方法以提高基片边缘处的处理均匀性。
Broadly speaking, the embodiments of the present invention provide an improved plasma processing mechanism, apparatus, and method to increase the process uniformity at the very edge of the substrate.
用此产品处理的铸铁标准件可获得外观呈深灰黑色、细密均匀、防锈性好的磷化膜。
The cast iron standard work pieces treated with the product can obtain deep grey, uniform and fine, good rustproof phosphating film.
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