通过对基片加热材料的微波设计，在MPCVD装置中获得大于基片台直径的均匀温度分布区。
By microwave designing for substrate heating materials, the larger uniform temperature field areas than the diameter of substrate holder in MPCVD device is obtained.
一种用于对容纳在一携载器中的基片进行热处理的装置，该装置包括一交叉流衬套，以便改善流过每个基片表面的气流的均匀性。
An apparatus is provided for thermally processing substrates held in a carrier. The apparatus includes a cross-flow liner to improve gas flow uniformity across the surface of each substrate.
本发明基片运载装置尤其适用于真空环境的基片传送，传送过程安全、定位精确。
The substrate carrier is particularly suitable for substrate transferring in vacuum environment, and the transferring process is safe and has accurate location.
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