... 等离子生成技术，在抑制了悬突(Overhang，嵌入铜的孔开口部因晶种层较厚而缩小的现象)的同时，还改善了台阶覆盖(Step Coverage)。从而优化了离子密度与能量的均衡。
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提供了一种以提高的台阶覆盖率高温沉积非晶碳膜的方法。
Methods for high temperature deposition an amorphous carbon film with improved step coverage are provided.
这种薄膜具有很小的压应力，很低的针孔密度，良好的台阶覆盖性等优点。
The films have advantages of slightly compressive stress, very low pin-hole density and superior step coverage.
衬底温度决定原子的表面迁移率，衬底温度是影响淀积的铝膜的均匀性和台阶覆盖能力的主要因素。
Therefore, the substrate temperature was the main factor which obviously affected the atoms distribution and step coverage of Al thin films.
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