实验表明，该设备总体性能处于国产双面光刻的先进水平，接近国外同类产品水平。
The results show that the performances of the tool are leading-edge at home and nearly reached the same level as that abroad.
其特点在于，利用KOH体硅腐蚀和双面光刻工艺制作了一种独特的三维自吸氧阴极结构。
The prototype features a unique 3D air-breathing cathode structure fabricated using KOH etching and double-side lithography.
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