从理论上分析了平面磁控溅射靶沉积薄膜的厚度均匀性。
The thickness uniformity of films deposited by planar magnetron sputtering target was analyzed theoretically.
详细介绍了在原台架上进行的圆锥型过滤元件上滤饼厚度均匀性的实验研究。
The experiments about uniformity of granular cake on lab-scale are introduced in detail. The fluidizing feature of fluidized-bed with conical filtration units is researched on the rebuilt test-bed.
以次磷酸盐为还原剂的化学镀镍因具有优良的耐蚀性、耐磨性和镀层厚度均匀性而得到广泛应用。
The electroless nickel planting had application very widely for its corrosion -resistant and fretting-resistant and homogeneous nickel-plate.
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