文章详细信息 关键词： 压印光刻;;高保真度;;模具;;压印工艺;;热误差 [gap=675]Keywords: imprint lithography;high-conformity;mold;imprint process;thermal error
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我们专有的 Jet and Flash™ 压印光刻 (J-FIL™) 技术是当今市场上唯一一项光刻解决方案，具备半导体行业向450mm 晶圆批量生产转型所需的性能。
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从几种纳米压印光刻技术中选择两种前景广阔的方法--热压印光刻(HEL)和紫外压印光刻(UV-NIL)技术给予介绍.两种技术对各种各样的材料以及全部作图的衬底大批量生产提供了快速印制.
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纳米压印光刻 NIL ; Nanoimprint lithography ; nanoimprinting lithography
基底完整压印光刻 SCIL
步骤和闪光压印光刻 SFIL
纳米压印光刻技术 nanoimprint lithography ; NIL
紫外纳米压印光刻 ultra-violet nanoimprint lithography
模具是纳米压印光刻 Nanoimprint lithography ; NIL
基板完整压印光刻 SCIL ; Substrate Conformal Imprint Lithography
的自对准压印光刻技术 self-aligned imprint lithography
用纳米压印光刻技术 nanoimprint lithography
除了半导体外，纳米压印光刻技术也有其他应用？
Status Offline Nanoimprint has applications other than semiconductors.
纳米压印光刻技术主要包括热压印、紫外固化压印和微接触法压印。
There are a few varieties in nanoimprint, which can be loosely divided into hot embossing, UV-cured imprinting, and micro-contact printing.
针对热压印光刻工艺中因热变形而导致精度丧失的问题，提出了冷压印光刻。
Aiming at the lost accuracy happened in HEL (hot embossing lithography) because of thermal distortion, room-temperature imprint lithography is proposed.
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