... chemical refining 化学精制 chemical resistance 化学阻 chemical stripping 化学剥离 ...
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电化学阻抗谱 EIS ; electrochemical impedance spectroscopy ; electrochemical impedance spectra ; corrosion resistance
电化学阻抗 EIS ; electrochemical impedance spectroscopy ; ac impedance
化学阻力 chemical resistance
局部电化学阻抗谱 LEIS
化学阻燃剂 chemical fire retardant
化学阻塞 chemical blocking
化学阻滞 chemical retardation
动电位电化学阻抗谱 DEIS
与电化学阻抗法 EIS or AC impedance
研究结果表明， HEDP是一种较为有效且稳定的化学阻垢药剂；
The results showed that HEDP was an effective and stable chemical scale inhibitor;
CEG技术能快速、准确地反映水质结垢能力，是一种简便、高效的开发新型化学阻垢药剂的研究手段。
CEG can reflect the scaling ability quickly and correctly and is a simple, highly effective measure to develop new chemical scale-inhibitor.
在蚀刻技术的每个阶段，固定高度的阻材料层会消失，暴露出不同部分的电路进行化学物质的侵蚀。
After each stage of the etching process a fixed depth of this is dissolved away, exposing a different part of the circuit to the etching chemicals.
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