刻蚀剂}trh}nt清除基片上无用的金属化涂层的化学 活J叶溶液。
通常，所有暴露在刻蚀剂中的材料都具有一定的刻蚀速率。
More often, all of the materials exposed to the etchant have a finite etch rate.
由光致刻蚀剂记录两束相干光干涉条纹是制作全息光栅的关键步骤。
Recording the interference fringe produced from two coherent light beams by use of photoresist is a key process in manufacturing a holographic grating.
本发明还公布了与光成像组合物配合使用，对玻璃，硅晶片、金属基材等进行深度刻蚀的化学刻蚀剂。
The invention also discloses a chemical etching agent matched with the compound to take deep etch to glass, silicon water and metal material.
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