之后，利用氨气等离子体促进化学气相沉积法对上述经电镀制程而形成的电镀金属层进行退火处理。
Finally, annealing process is carried out in the electroplated metal layer formed by the electroplating process through chemical vapor deposition method under promotion of ammonia plasma.
为了让发光层内铒离子具有光活化及其他的化学反应的发生，在制程中热退火是必须的。
For erbium ion in light-emitting layer with light activated process and other chemical reaction, it is necessary to anneal the devise with high temperature in fabrication process.
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