折射率、色散和吸收系数是用于超高速全光开关的光学材料的重要品质指数。
Refractive index, chromatic dispersion and absorption coefficient are material figures of merit for ultrafast all optical switch.
经过紫外氘灯光源照射5个小时之后，薄膜厚度减少了55%，而折射率从1.484减小为1.445，光学厚度更是随着照射时间增长呈现出指数变化。
After irradiated by ultraviolet (UV) light with a deuterium lamp for 5 h, the thickness of film decreases largely by 55%, and the refractive index of film changes from 1.484 to 1.445 at 550 nm.
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