接近式光刻中一般采用柯勒照明系统，并采用蝇眼透镜形成多点光源均匀掩模面的光场分布。
Kohler illumination was used in proximity lithography, and a flys eye lens was adopted to form multi-point source in order to uniform the light intensity on the mask plane.
分别从横向和纵向两个方面分析了改进型分形波带片的光场分布，结果表明，在宽带光照明下，改进型分形波带片的焦深也大于常规的分形波带片。
The analysis of the lateral and axial properties shows that the focal depth of the modified FZP is larger than the FZP under the broadband lighting.
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