并对两种制备方法做了比较，在分析了制作的凸点的质量后，认为经过改进的蒸发结合光刻法可以制作高质量的阵列凸点。
The analysis of the quality of the bumps fabricated by using these two methods shows that the improved evaporation plus lithography method can be used to fabricate bumps with high quality.
本文详细阐述了光刻热熔法的基本原理及微透镜设计方法，并讨论了工艺参数对微透镜列阵质量的影响。
The principle of the method and the design model of refractive microlens are described. The effects of fabrication parameters on the quality of the microlens are discussed.
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