根据体光伏效应和压电性的叠加，可以解释光致伸缩现象。
Photostriction can be explained by superposition of the bulk photostrictive effect and piezoelectricity.
用该系统检测了仅用CF4作为刻蚀气体刻蚀非晶硅基薄膜的等离子体光发射谱。
The optical emission spectrum of r. f. plasma during amorphous silicon based film etching in CF4 gas is detected.
上述试验结果表明，可以用等离子体光信号的幅值高低和波动大小作为焊接质量实时监测和控制的特征信号。
The experiments indicate that the amplitude of plasma optic signal and fluctuation can be used as characteristic signal for real-time monitoring and control for titanium laser welding.
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