本文对低价钨试剂与有机化合物的脱氧、脱卤还原反应作了简要的叙述。
This paper reviews the deoxygenative reduction and dehalogenative reduction of organic compounds with the low valent tungsten reagents.
于是就能够降低形成在有机化合物层(1)(102)与有机化合物层(2)(103)之间的能量势垒。
The energy barrier formed between the organic compound layer (1) (102) and the organic compound layer (2) (103) thus can be lowered.
研究显示，在消除有机化合物和氮含量方面，该设备与传统机械处理设施的处理能力相当。
A study showed the devices are on par with traditional mechanical treatment facilities for removing organic compounds and nitrogen.
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