x-ray lithography X 射线光刻技术
x ray lithography x 射线光刻技术
X-ray lithography X射线光刻 ; 第一步 ; X光光刻 ; 射线印刷术
soft X-ray lithography 软X射线光刻
Proximity X-ray Lithography 射线微影术
x - ray lithography x射线光刻
x-ray lithography mask x射线光刻掩模
x-ray lithography system x射线光刻机
The fabrication procedure of the mask and results of the deep X ray lithography are given.
给出了该掩模设计制作工艺过程及深x射线光刻结果。
In synchrotron radiation X-Ray lithography, distortion of mask is caused by its initial tension, stress and inhomogeneous thermal effect.
在同步辐射X射线光刻中,由于掩模的初始张应力和掩膜的非均匀受热将使掩模产生热畸变。
The image edge-enhanced technique was proposed to improve the automatic aligning efficiency and aligning accuracy in the X-ray lithography aligning system, and the numerical analysis was given.
提出了用于提高X射线光刻对准系统自动对准效率和对准精度的图像边缘增强技术,并进行了数值分析。
应用推荐