A new type technique of semiconductor cleaning is studied via infrared absorption spectra, X ray photoelectron spectra and surface tension detector.
报道了利用红外吸收谱、X射线光电子谱和表面张力测试仪对新型半导体清洗工艺进行研究的结果。
Surface properties of PVC were characterized by the contact Angle, surface tension, X-ray photoelectron spectroscopy (XPS) and electron spin resonance (ESR).
等离子体改性前后pvc的表面特性通过接触角、表面张力、X -光电子能谱(XPS)、电子自旋共振(esr)表征。
In synchrotron radiation X-Ray lithography, distortion of mask is caused by its initial tension, stress and inhomogeneous thermal effect.
在同步辐射X射线光刻中，由于掩模的初始张应力和掩膜的非均匀受热将使掩模产生热畸变。
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