这项工作的目的是评估使用一个众所周知的低电阻的难熔金属硅化物,如硅化钨(WSIX)作为栅电极,以实现更快的开关速度。
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WSix deposition 硅化钨沉积
Dynamic random access memory (DRAM) suffers from the bridge issue due to the WSix residue on gate sidewall, which is the bottleneck to enhancing the product's yield and reliability.
动态随机存储器栅极侧壁硅化钨残留造成的短路成为制约提高产品良率及可靠性的瓶颈。
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