A new design of off-axis five mirrors optics was presented which was used to extreme-ultraviolet lithography. It was very suit for the commercialization at optical quality and free work distance.
本文探讨了一种可应用于极紫外光刻光学系统的离轴五反射镜系统，它在光学质量、自由工作距离方面满足了极紫外光刻商业化的要求。
An apparatus and method for maintaining immersion fluid (212) in the gap adjacent the projection lens (16) during the exchange of a work piece (208) in a lithography machine (10) is disclosed.
本发明公开一种设备和方法，用于在更换平板印刷机(10)中工件(208)期间，将浸没流体(212)保持在邻接投射透镜(16)的间隙中。
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