The following illustration shows the output of a single pixel-width line that falls in the middle of a device pixel.

下图显示在设备像素中间的单像素宽度线条的输出。

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The non-planarity of a surface post electroplating process is usually dependent on variations of key layout characteristics including line width, line spacing and metal density.

铜电镀工艺后表面的不平整度通常取决于版图关键特征，包括线宽，线间距和金属密度。

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By applying more or less pressure, users can control line width and opacity of a drawn line.

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Intel announced this week that it would start to transition to 14 nm line width semiconductor processes by the end of 2013.

FORBES: Rare Gases and Fine Lines

Scaling the capacity with the line width indicates that 14 nm chips could have capacities of about 774 Gbits and 10 nm chips could have capacities of 243 Gbit.

FORBES: Rare Gases and Fine Lines