A new process for the fabrication of the surface electrode of nuclear microbattery using lift-off process with SU8 photo resist is proposed,via use BP212 photo resist as a sacrificial layer,the SU8 photo resist in the channels was removed effectively,and the surface electrode of the nuclear microbattery was fabricated successfully.
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Use all Via types 在自动布线或自动路径手工走线下
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