water vapor plasma arc 水蒸气等离子弧光
aqueous vapor plasma arc 水蒸气等离子弧
vapor plasma arc welding 水蒸气等离子弧焊
plasma enhanced chemical vapor deposition 等离子体增强化学气相淀积 ; 化学气相沉积法 ; 等离子体化学气相沉积
plasma chemical vapor deposition 等离子体化学汽相淀积 ; 等离子化学气相沉积 ; 等离子体化学气相沉积法
plasma chemical vapor 等离子体化学气相沉积
laser plasma vapor deposition 激光等离子体气相沉积法
plasma-induced vapor graft 等离子体引发气相接枝
arc plasma vapor phase reaction 等离子气相反应
plasma enhanced vapor deposition 等离子体增强化学气相沉积
A novel passivation technology of porous silicon (PS) surface, i. e. , depositing diamond film on the PS surface by microwave plasma assisted chemical vapor deposition (MPCVD) method, was developed.
提出了一种新颖的多孔硅表面钝化技术，即采用微波等离子体辅助的化学气相沉积（MPCVD）方法在多孔硅上沉积金刚石薄膜。
Plasma chemical vapor deposition in silane radio frequency glow discharge is a main fabrication technology of hydrogenated amorphous silicon (a-Si: h) films.
射频辉光放电硅烷等离子体化学汽相沉积是制备氢化非晶硅薄膜的主要工艺技术。
A series of microcrystalline silicon thin films were fabricated by very high frequency plasma-enhanced chemical vapor deposition at different substrate temperatures (T_s).
采用甚高频等离子体增强化学气相沉积技术制备了不同衬底温度的微晶硅薄膜。
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