The design of a new kind of UV or DUV lithography lenses is described in this paper.

设计了一种新的紫外或深紫外光刻物镜。

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The 2-d simulation of thick SU-8 photoresist profile after UV lithography is presented.

这篇论文是厚su - 8光刻胶接触式UV光刻后形貌的两维模拟。

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UV lithography, silicon etching and soft lithography were adopted to fabricate micropillar arrayed cell culture substrates.

以紫外光光刻、硅蚀刻及软光刻技术制备了微柱阵列型细胞培养基底。

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If this (topdown) manufacturing process is to be based on the most modern forms of deposition (including epitaxy), e-beam or ultra-deep UV lithography and precision etching, the mainstay of microelectronics and optoelectronics fabrication, then there are strict limits described below for which one-off fabrication is possible, but manufacture is not.

FORBES: Are There Physical Limits to Nanotechnology?