The designed SOI nanowire AWGs were fabricated using ultraviolet lithography and induced coupler plasma etching.

通过深紫外光刻和感应耦合等离子刻蚀设备，制备了所设计的器件。

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The results of electronic microscope scanning of sub-micrometer patterns by far ultraviolet lithography are given.

并给出远紫外光刻亚微米级图形的电镜扫描照片结果。

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All-reflective optical systems, due to their material absorption and low refractive index, are used to create the most suitable devices in extreme ultraviolet lithography (EUVL).

由于材料的吸收和低折射率问题，极紫外光刻所采用的光学系统发展趋势是全反射型。

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To avoid heading into the twilight zone of extreme ultraviolet lithography (or, worse, X-rays), chipmakers need to shrink the light.

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Under the Co-Investment Program, which was announced on July 9, 2012, ASML will accelerate the development of key lithography technologies needed to extend Moore's Law, notably Extreme Ultraviolet (EUV) lithography.

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The specific technology areas that Intel is investing in are 450mm wafers and extreme ultraviolet (EUV) lithography.

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