... 薄膜引出线 thin-film terminal 薄栅氧化层 thin gate oxide 补偿半导体 compensated semiconductor ...
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Ultra-Thin Gate Oxide 超薄闸极氧化层
TDDB(time-dependent dielectric breakdown)is a key method to value the quality of thin gate oxide.
经时绝缘击穿（TDDB）是评价薄栅氧化层质量的重要方法。
A control gate having a thin gate oxide film is formed over a center channel portion of the channel region.
在沟道区的中央沟道部分上形成具有薄的栅氧化物膜的控制栅。
Hot-carrier enhanced TDDB effect of ultra-thin gate oxide is investigated by using substrate hot-carrier injection technique.
本文通过衬底热载流子注入技术，研究了热载流子增强的超薄栅氧化层TDDB效应。
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