Magnetron sputtering process has widely been applied to thin film preparation, during which, the quality of thin film is affected badly by the current stability of target.

磁控溅射技术在薄膜制备领域的应用十分广泛，而溅射靶电流的稳定性极大的影响溅射镀膜的膜层质量。

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Thin film manganin gages and ytterbium gages were fabricated by magnetron sputtering.

采用磁控溅射法制备锰铜薄膜，溅射和真空蒸发法制备镱薄膜。

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Metallic antimony thin film was deposited by magnetron sputtering and it was investigated as anode materials for lithium-ion batteries.

采用磁控溅射方法制备金属锑薄膜，并把它作为锂离子二次电池负极进行研究。

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