flat-tension mask 扁平面板掩膜
flat tension mask 平面张力屏蔽
Compliant tension mask assembly 发明名称
Aqua Tension Facial Mask 紧致保湿纾缓面膜
tension type mask 张紧式荫罩
In synchrotron radiation X-Ray lithography, distortion of mask is caused by its initial tension, stress and inhomogeneous thermal effect.
在同步辐射X射线光刻中，由于掩模的初始张应力和掩膜的非均匀受热将使掩模产生热畸变。
A clamping arrangement is used to tension the mask and to conform the mask to a shape defined by the frame.
一种夹持结构被用以拉紧所述掩模并使所述掩模与所述机架限定的形状贴合。
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