laser-target plasma 激光靶等离子体
target plasma concentration 靶浓度
target plasma concentrations 靶浓度
Target plasma Anomalous effect 靶等离子体反常效应
plasma target 等离子体靶
The stealth technology includes contour design, absorbing materials and plasma stealth technologies, the purpose is to reduce sectional area of average radar for target.
雷达隐身包括外形设计、吸波材料和等离子体等隐身技术，其实质是降低目标的平均雷达截面积。
The relation between the plasma density in unmagnetized plasma and the stealth of target is investigated in this paper.
对不均匀非磁化等离子体密度与目标隐身的关系进行了研究。
Hardening depth related to the technical parameters and the quenching temperature field is an important target by plasma surface quenching.
硬化层深度是等离子弧表面淬火效果的重要指标之一，而硬化层深度与工艺参数、淬火过程中温度场的变化密切相关。
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