A novel passivation technology of porous silicon (PS) surface, i. e. , depositing diamond film on the PS surface by microwave plasma assisted chemical vapor deposition (MPCVD) method, was developed.

提出了一种新颖的多孔硅表面钝化技术，即采用微波等离子体辅助的化学气相沉积（MPCVD）方法在多孔硅上沉积金刚石薄膜。

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Sedimentary speed: unit time parts deposition on the surface of the metal thickness.

沉积速度：单位时间内零件表面沉积出金属的厚度。

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Electroplating: use the principle of electrolysis, the metal and alloy parts deposition in the surface, form even, density, good adhesion of the metal layer process.

电镀：利用电解原理，使金属或合金沉积在制件表面，形成均匀、致密、结合力良好的金属层的过程。

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And it's believed that the high chemical reactivity of the surface is due to the deposition of chemically active gases from the atmosphere onto the surface, gases like hydrogen peroxide and ozone.

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