The electrical properties as the function of oxygen percentage, defects in the films, and the roughness of the substrate surface were investigated.
研究了氧气含量、薄膜缺陷、基底粗糙度等因素对氧化钽电学性能的影响。
The effects of substrate material and surface roughness on it are studied.
研究了衬底材质及表面粗糙度对薄膜结构的影响。
However, when the substrate negative bias is more than 200 v, the surface roughness of the films is increased because of the increased graphite phase in the films.
当负偏压超过200 V后，由于薄膜中石墨相增多，薄膜表面粗糙度将增大。
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