Exposure dose should be changed with the thickness of SU-8 photoresist.
根据SU - 8胶的厚度确定曝光剂量的大小。
The new set of models are more proper for lithography simulation for thick SU-8 resist.
对于厚su - 8胶的模拟，这种模型比普通的模拟模型更加合适。
Therefore, novel models for thick chemically amplified photoresist which fit well characters of SU-8 resist is set up.
因而这篇文章包括了我们在厚的化学放大胶光刻模型方面的努力，这些新的模型适用于SU-8胶。
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