Methods for high temperature deposition an amorphous carbon film with improved step coverage are provided.

提供了一种以提高的台阶覆盖率高温沉积非晶碳膜的方法。

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The films have advantages of slightly compressive stress, very low pin-hole density and superior step coverage.

这种薄膜具有很小的压应力，很低的针孔密度，良好的台阶覆盖性等优点。

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Therefore, the substrate temperature was the main factor which obviously affected the atoms distribution and step coverage of Al thin films.

衬底温度决定原子的表面迁移率，衬底温度是影响淀积的铝膜的均匀性和台阶覆盖能力的主要因素。

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