The method for reducing standing wave effect is studied.
研究了减小驻波效应的方法；
Standing wave is parasitic effect of exposure, generated by multi reflection and interference of rays vertically incident upon parallel medium layers.
驻波是曝光中的寄生效应，是光线垂直入射到不同的平行平面介质层之间，经多次反射并干涉形成的。
It is accepted that standing wave does more effect on the lithography patterns of thin resist, whereas less of thick resist.
一般认为，驻波效应对薄胶的光刻图形有较大的影响，而对厚胶的光刻图形影响不大。
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