Sputtering target is usually made of pure molybdenum sheet.
而溅射靶材多以金属纯钼板材为主。
Uses: sputtering target, physical vapor deposition, high temperature alloys.
溅射靶材、物理气相沉积、高温合金。
The thickness uniformity of films deposited by planar magnetron sputtering target was analyzed theoretically.
从理论上分析了平面磁控溅射靶沉积薄膜的厚度均匀性。
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