是直接ZnO作为钯材，调整溅镀气体 (Sputtering gas)氩气(Ar)与氧气(O2)的比例及基板的温度來制作ZnO薄 膜。以溅镀方式沉积ZnO薄膜。
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composition of sputtering gas 气体组分
Reactive Gas Sputtering 反应性气体溅镀
hot gas sputtering 热气体溅射
The results about the research on the characters of ion beam sputtering show that grid voltage and sputtering gas pressure have great influences on ion beam distribution and current.
溅射特性研究结果表明：屏极电压和溅射气压对离子束均匀性和束流密度影响显著；
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