Three pole reaction sputtering has the properties of simple equipment, easy process and fined film.
三极反应溅射具有设备简单，工艺简便，镀层致密等特点。
Comparing with general sputtering method, this equipment has the advantages of decreasing the sputtering voltage and increasing the rate of deposition obviously.
与普通溅射方法相比，本设备的优点是：溅射电压大大降低，而淀积速率提高很多。
The technology and equipment of the vacuum sputtering coating have the extremely broad application and the development in the future.
真空溅射镀膜技术及设备在当今和未来都拥有十分广阔的应用领域和发展前景。
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