The third part is to use the sputtering, photolithography to produce heaters and temperature sensors which heat the reaction micro chamber and provide the temperature condition for the PCR reaction.
第三，用溅射、光刻等工艺在微型腔体底部制作微型加热器和温度传感器，实现对反应腔体的加热及其温度的精确测量，提供PCR扩增反应所需的温度条件。
This design aims at the characteristics of magnetron sputtering deposition, and mainly ameliorate the design of the chamber of the magnetron sputtering machine.
本设计主要对磁控溅射镀膜机真空室进行改进设计，以改善磁控溅射镀膜的工艺条件。设计内容包括真空室及相关机构设计、计算。
Special importance were attached to the design and calculation of deposition chamber, vacuum system, sample system, sputtering cathode and control system.
作为重点，对真空室、真空系统、工件架、磁控溅射靶、控制系统等进行了相应的设计分析和计算。
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