... 涂布被覆 coating 旋转涂布 Spin Coating ; spin-coat ; Spinless Coating 刷涂布 brush coating ...
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Spin Coat 旋压覆盖 ; 旋压覆盖法
Spin Coat Method 及旋压覆盖法
The chemical is widely used in the production of LSI, VLSI and other semiconductors to remove photoresist edge bead that occurs during typical spin coat wafer processing.
该试剂用于清除匀胶后残留于硅片边缘及背面的光刻胶，已经广泛应用于中、大规模集成电路及其它半导体器件的生产。
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