Principle and method for designing high voltage thin film SOI devices with linearly doped drift region are given.
给出了漂移区为线性掺杂的高压薄膜soi器件的设计原理和方法。
Several methods manufacturing the SOI(simulator on silicon) materials are described and the main application fields of SOI devices are presented.
介绍了SOI材料的几种制备技术及SOI材料的主要应用领域。
If we select substrate temperature, laser power and the scan speed properly, we can get good crystallization. It is useful to the fabrication of SOI devices.
适当选择衬底温度、激光功率和扫描速度可望获得良好的结晶，它对SO I器件的制作是有意义的。
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