The present invention provides methods and apparatus for processing semiconductor substrates.

本发明提供一种用于处理半导体基板的装置。

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Methods of processing semiconductor substrates using the showerhead electrode assemblies are also disclosed.

还公开使用这些喷头电极总成处理半导体基片的方法。

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A metal-oxide secondary emission film can be deposited on glass, ceramic or semiconductor substrates by thermal decomposition of an organo-metal alkoxide.

利用某些有机烷氧基金属化合物的热分解，可在玻璃、金属、陶瓷或半导体基片上沉积相应的金属氧化物次级发射膜。

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He had spent a career figuring out how to deposit chemicals very carefully on substrates, first at Los Alamos National Laboratory and later at the semiconductor machinery companies Novellus and KLA-Tencor.

FORBES: Energy & Genius